Xiang Shi-Li | Materials Science | Best Researcher Award

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Dr. Xiang Shi-Li | Materials Science | Best Researcher Award

Head of Photolithography Research and Development at Hubei Jiufengshan Laboratory, China

Xiang Shi-Li is a semiconductor technology researcher with a focus on lithography manufacturing and semiconductor materials. He earned his Doctorate degree from Huazhong University of Science and Technology and currently leads the Lithography Research and Development department at Hubei Jiufengshan Laboratory in Wuhan, China. Xiang’s research interests encompass advanced lithography manufacturing, intelligent materials, bioinspired systems, RF devices, and MEMS. His work aims to enhance the efficiency and performance of semiconductor devices through innovative manufacturing processes and materials.

Professional Profile:

đź“š Education:

Xiang Shi-Li pursued his doctoral studies at Huazhong University of Science and Technology, where he focused on semiconductor manufacturing. During his time there from September 2016 to June 2021, he conducted research and coursework to deepen his understanding of advanced lithography manufacturing, semiconductor materials, and photoresist polymer materials. His doctoral research likely involved exploring innovative approaches to semiconductor manufacturing processes and materials, aiming to improve efficiency and performance in the field. This educational background has equipped him with the knowledge and skills necessary to excel in his current role as the Head of Lithography Research and Development at Hubei Jiufengshan Laboratory.

📝Work Experience:

Xiang Shi-Li has extensive experience in the field of semiconductor technology, particularly in lithography research and development. Since July 2022, he has been leading the lithography research and development efforts at Hubei Jiufengshan Laboratory. In this role, he is responsible for overseeing the development of advanced lithography manufacturing processes, semiconductor materials, and photoresist polymer materials. Prior to his current position, Xiang served as an Associate Professor, contributing to the Process R&D Center. During this time, he likely conducted research, taught courses, and mentored students in semiconductor manufacturing and related fields. His work may have included developing new technologies and methodologies to improve semiconductor manufacturing processes and materials. Overall, Xiang’s work experience reflects his expertise and dedication to advancing semiconductor technology. His contributions in research and development have the potential to drive innovation and improve the performance of semiconductor devices and systems.

đź“ŠResearch focus:

Xiang Shi-Li’s research focuses on various aspects of semiconductor technology, with a particular emphasis on lithography manufacturing. His work includes investigating advanced lithography manufacturing processes to improve semiconductor device performance and efficiency. Additionally, Xiang is interested in semiconductor materials and photoresist polymer materials, exploring their properties and applications in semiconductor manufacturing. He also delves into intelligent materials and bioinspired systems, likely looking at how nature-inspired designs can be applied to improve semiconductor technologies. Xiang’s research extends to radio frequency (RF) devices and micro-electro-mechanical systems (MEMS), where he explores new materials and fabrication techniques for these devices. Overall, Xiang’s research is characterized by a multidisciplinary approach, combining aspects of materials science, engineering, and physics to advance semiconductor technology. His work has the potential to contribute significantly to the development of next-generation semiconductor devices and systems.

 

Publications :

Photodegradable Polyurethane Resist with High Photosensitivity Based on Hexaarylbiimidazole Molecule Photoswitch

Authors: Xiang, S.-L.; Luo, P.-F.; Ren, Y.-Y.; Liu, J.; Zhu, M.-Q.

Journal: ACS Applied Polymer Materials, 2024

Volume: 6

Issue: 5

Pages: 2496–2503

Dual nonionic photoacids synergistically enhanced photosensitivity for chemical amplified resists

Authors: Peng, L.-Y.; Xiang, S.-L.; Huang, J.-D.; Liu, J.; Zhu, M.-Q.

Journal: Chemical Engineering Journal, 2024

Volume: 482

Pages: 148810

Recent advances in super-resolution optical imaging based on aggregation-induced emission

Authors: Zhu, F.-Y.; Mei, L.-J.; Tian, R.; Zhu, M.-Q.; Tang, B.Z.

Journal: Chemical Society Reviews, 2024

Status: Article in Press

Visible-light-driven isotropic hydrogels as anisotropic underwater actuators

Authors: Shi-Li Xiang, Yu-Xuan Su, Hong Yin, Chong Li*, Ming-Qiang Zhu*

Journal: Nano Energy

Year: 2021

Volume: 85

Page: 105965

Photoplastic self-healing polyurethane springs and actuators

Authors: Shi-Li Xiang, Qiong-Xin Hua, Peng-Ju Zhao, Wen-Liang Gong, Chong Li*, Ming-Qiang Zhu*

Journal: Chemistry of Materials

Year: 2019

Volume: 31

Issue: 14

Pages: 5081-5088